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1)××éÄPhotoresist(ÎÃöÈù÷蚀剂)Úâ导体Íï业î§Öùð¤Þ£æîì¼îïãÓ图.(Record of 2002 joint conference of electrical and electronics engineers in Kyushu.2002.9.26) |
2)××éÄPhotoresist(ÎÃöÈù÷蚀剂)Úâ导体Íï业î§Öù复óôûöîïãÓ图.(Record of 2002 joint conference of electrical and electronics engineers in Kyushu.2002.9.26) |
3)Reconstruction properties of Fresnel holograms using photoresist emulision.(Estratto da:Atti della Fondazione Giorgio Ronchi,Anno LVIII.n.2-marzo-aprile.2003) |
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